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Solubility of Gases in Liquids. 20. Solubility of He, Ne, Ar,

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The characteristics of Si etching with electron cyclotron resonance (ECR) plasma of SF6–CF4 are studied in order to improve anisotropy in dry etching

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Chemistry studies of SF6/CF4, SF6/O2 and CF4/O2 gas phase

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SFsub6/sub gas has excellent dielectric strength, but it causes global warming about 23900 times more than COsub2/

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The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this


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