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characteristics of SF6-N2 and SF6-CF4 gas mixtures |

2017101- on the insulation characteristics of SF6-N2 and SF6-CF4 gas mixtures an experimental platform of spectrum for gas discharge was set up t

SF6+CF4+Ar mixtures (a) 40% | Download Scientific Diagram

Download scientific diagram| The synergism in the dielectric strength of SF6+CF4+Ar mixtures (a) 40% Ar black line, (b) 50% Ar red line, (c)

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A mixture of acetylene (C2H2) and carbon tetrafluoride (CF4) gas was good quality properties such as transparency, biodegradation and good mechanical

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in 50%SF6-50%CF4mixtures at 1 atm -

The breakdown and the corona inception voltages experiments of SFsub6/sub/CFsub4/sub mixtures in non-uniform

dielectric breakdown properties of hot SF6–CF4 mixtures

Full-text (PDF) | The dielectric breakdown properties of SF6–CF4 mixtures were investigated at different ratios of SF6, 0.01–1.6 MPa, and gas

Electron swarm coefficients in SF6 and CF4 gas mixtures from

the electron swarm parameters such as effective ionization coefficient, , drift velocity and diffusion coefficient of SF6 and CF4 gas mixtures

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Last modification on : Thursday, February 7, 2019 - 4:56:13 PMReactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2

Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

is used as a gas medium in gas-insulated good responses to NO2, whereas CF4- and SF6-adsorption sites on MWNTs surface for gas

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place of SF6 used in gas insulated switchgear (GIS) as insulating gas. The results show that CF3I may break down after attaching electron in

Use of SF6 and CF4 | SpringerLink

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

is used as a gas medium in gas-insulated good responses to NO2, whereas CF4- and SF6-adsorption sites on MWNTs surface for gas

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Properties of Binary Gas Mixtures of CH4, CF4, SF6, and C(

The twelve binary mixtures considered here are: Ar–CH4, Ar–CF4, Ar–SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

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is used as a gas medium in gas-insulated good responses to NO2, whereas CF4- and SF6-adsorption sites on MWNTs surface for gas

for remote sensing of greenhouse gases CH4, CF4and SF6 |

Spectroscopic tools for remote sensing of greenhouse gases CH4, CF4 and SF6 Authors Authors

Chemistry studies of SF6/CF4, SF6/O2 and CF4/O2 gas phase

SF6/CF4, SF6/O2 and CF4/O2 plasmas generated in a radio-frequency Hollow Cathode Reactive Ion Etching (HCRIE) reactor keeping constant the

Comparison of SF6 and CF4 Plasma Treatment for Surface Hydro

which was explained by the full dissociation of the SF6 and CF4 gases, leading to high concentrations of fluorine radicals in the plasma and thus

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Reactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2 etch products. Applied Physics Letters, American Institute of Physics, 2001,

c-C_4F_8/CF_4SF_6SST-200806

This paper deals with the characteristics of partial discharge (PD) in green gas for a grid (g3), which is thought to be a promising eco-friendly

LW3-12ⅡG/400-12.5_58

Spectroscopic tools for remote sensing of greenhouse gases CH4, CF4 and SF6 Authors Authors and affiliations