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Solubility of Gases in Liquids. 21. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in 2,2,4-Trimethylpentane at

Characterization and antimicrobial properties of fluorine-

The films deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

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The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

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SF6 and CF4 gases, leading to high corresponding to the N2 molecule are observed (-generated plasmas produced in Ar/SF6 mixtures

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These breakers utilize a gas mixture of SF6 and CF4 or SF6 and N2 to prevent condensation of the SF6 gas and have been type tested at -50oC to

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g3 gas with 4% NOVECTM 4710/96% CO2 was gas or gas mixture for substituting SF6. Trifluoroiodomethane (CF3I) has been introduced

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The Ostwald coefficients L2,1 of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2, 6 ≤ l

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Breakdown characteristics of SF6 /CF4 mixtures in 25.8 kV

SFsub6/sub gas has excellent dielectric strength, but it causes global warming about 23900 times more than COsub2/

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of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~,

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The Solubility of Gases in Liquids 9. Solubility of He, Ne, Ar, Kr, N2, O2, CO, CO2, CH4, CF4, and SF6 in some Dimethylcyclohexanes at 298

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The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

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Last modification on : Thursday, February 7, 2019 - 4:56:13 PMReactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2

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of Si and WSiN using ECR plasma of SF6-CF4 gas mixture

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Electron swarm coefficients in SF6 and CF4 gas mixtures from

Electron swarm coefficients in SF6 and CF4 gas mixtures from Monte Analysis of the insulation characteristics of c-C4F8 and N2 gas

dielectric breakdown properties in 50%SF6-50%CF4mixtures

Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6 at Two Film gas mixture density heat capacity forced convective heat transfer heat transfer

- Reactive ion etching of SiC in SF6 gas: detection of CF,

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SF6 /N2 -- 5 -- 2 19 SF6/CF4 2 62 7 46 16 MIXED GAS CIRCUIT BREAKERS • S•FF6i/rNst2 mixture: breakers purchased (1988 – 1990) were